Large optical band gap Al Cr oxide thin films for Deep UV lithography applications
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Jiang, Z-T, Yamaguchi, T., Aoyama, M. and Ohshimo, K. (1998) Large optical band gap Al Cr oxide thin films for Deep UV lithography applications. In: 22nd Condensed Matter Physics Meeting, 4 - 6 February, Wagga Wagga, Australia.
| Item Type: | Conference Item |
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| URI: | http://researchrepository.murdoch.edu.au/id/eprint/5527 |
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