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An overview and future development of single layer halftone phase shifting mask materials for Deep UV microlithography

Jiang, Z-T, Hong, S.B., Kim, E., Bae, B-S, No, K., Lim, S., Woo, S-G and Koh, Y-B (1996) An overview and future development of single layer halftone phase shifting mask materials for Deep UV microlithography. In: The Korean Ceramic Society Conference.

Item Type: Conference Item
Notes: Invited talk
URI: http://researchrepository.murdoch.edu.au/id/eprint/5516
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