An overview and future development of single layer halftone phase shifting mask materials for Deep UV microlithography
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Jiang, Z-T, Hong, S.B., Kim, E., Bae, B-S, No, K., Lim, S., Woo, S-G and Koh, Y-B (1996) An overview and future development of single layer halftone phase shifting mask materials for Deep UV microlithography. In: The Korean Ceramic Society Conference.
| Item Type: | Conference Item |
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| Notes: | Invited talk |
| URI: | http://researchrepository.murdoch.edu.au/id/eprint/5516 |
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