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Cr based attenuated phase shifting mask materials for 193nm lithography

Kim, E., Hong, S.B., Jiang, Z-T, No, K., Lim, S., Woo, S-G and Koh, Y-B (1996) Cr based attenuated phase shifting mask materials for 193nm lithography. In: Second international symposium on 193nm lithography, 30 July - 2 August, Colorado Springs, Colorado.

Item Type: Conference Item
URI: http://researchrepository.murdoch.edu.au/id/eprint/5514
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