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Large optical band gap Al Cr oxide thin films for Deep UV lithography applications

Jiang, Z-T, Yamaguchi, T., Aoyama, M. and Ohshimo, K. (1998) Large optical band gap Al Cr oxide thin films for Deep UV lithography applications. In: 22nd Condensed Matter Physics Meeting, 4 - 6 February, Wagga Wagga, Australia.

Publication Type: Conference Item
URI: http://researchrepository.murdoch.edu.au/id/eprint/5527
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