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Investigation of silicon rich nitride (SiRN) phase shifting mask material for 193nm lithography

Jiang, Z-T, Yamaguchi, T., Aoyama, M. and Asinovsky, L. (1997) Investigation of silicon rich nitride (SiRN) phase shifting mask material for 193nm lithography. In: 3rd International Symposium on 193nm Lithography, 29 June - 2 July, Onuma, Hokkaido, Japan.

Publication Type: Conference Item
URI: http://researchrepository.murdoch.edu.au/id/eprint/5520
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