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Application of DV Xα cluster method to the Cr Al oxide mask materials for Deep UV lithography

Jiang, Z-T, Yamaguchi, T., Kim, E., Hong, S.B., No, K., Kang, Y., Park, J. and Koh, Y-B (1997) Application of DV Xα cluster method to the Cr Al oxide mask materials for Deep UV lithography. Bulletin of the Society for Discrete Variational Xα, 10 (2). p. 22.

Publication Type: Journal Article
Publisher: Society for Discrete Variational Xα
Notes: Conference paper
URI: http://researchrepository.murdoch.edu.au/id/eprint/5511
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