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The relationship between deposition characteristics and properties of SrTiO3 films in ECR-PEMOCVD process

Lee, J.S., Bae, J.S., Song, H.K., Jun, B-H, Gorman, J., Jiang, Z-T and No, K. (1997) The relationship between deposition characteristics and properties of SrTiO3 films in ECR-PEMOCVD process. In: Fourteenth International Conference on Chemical Vapor Deposition, 5-9 September, Paris, France.

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Abstract

Either Ar or NH3 gas was used as a carrier gas for Sr(TMHD)2 to prepare SrTiO3 thin films in ECR-PEMOCVD process. The films deposited with Ar carrier gas show inferior electrical properties due to the degradation of Sr(TMHD)2, during the evaporation process. In order to overcome this degradation of Sr(TMHD)2, NH3 gas was used as a carrier gas. The effects of Sr/Ti ratio on the refractive index and the effects of deposition rate on the orientation of films were investigated on the films fabricated using NH3 carrier gas. A significant improvement in dielectric and leakage properties was obtained.

Publication Type: Conference Paper
Publisher: The Electrochemical Society
Copyright: (C) The Electrochemical Society
Notes: Appears in: Chemical vapor deposition: proceedings of the Fourteenth International Conference and EUROCVD-11, Edited by M.D. Allendorf and C. Bernard,
URI: http://researchrepository.murdoch.edu.au/id/eprint/5506
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