Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation
Jiang, Z-T, Hong, S., Kim, E., Bae, B-S, Lim, S., Woo, S-G, Koh, Y-B and No, K (1997) Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation. Applied Surface Science, 113-14 . pp. 680-684.
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The investigation of single layer halftone phase shift mask (SLHTPSM) has been carried by both simulation and chromium fluoride film fabrication. Theoretical analysis provides the optimum SLHTPSM constructions for I-line (365 nm), KrF (248 nm) and ArF (193 nm) microlithographies. A fully characterization of chromium fluoride film processed by de magnetron sputtering shows a feasibility of using this film in the fabricating DUV-PSM.
|Publication Type:||Journal Article|
|Copyright:||1997 Elsevier Science B.V.|
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