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Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation

Jiang, Z-T, Hong, S., Kim, E., Bae, B-S, Lim, S., Woo, S-G, Koh, Y-B and No, K (1997) Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation. Applied Surface Science, 113-14 . pp. 680-684.

Link to Published Version: http://dx.doi.org/10.1016/S0169-4332(96)00933-6
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Abstract

The investigation of single layer halftone phase shift mask (SLHTPSM) has been carried by both simulation and chromium fluoride film fabrication. Theoretical analysis provides the optimum SLHTPSM constructions for I-line (365 nm), KrF (248 nm) and ArF (193 nm) microlithographies. A fully characterization of chromium fluoride film processed by de magnetron sputtering shows a feasibility of using this film in the fabricating DUV-PSM.

Publication Type: Journal Article
Publisher: Elsevier BV
Copyright: 1997 Elsevier Science B.V.
URI: http://researchrepository.murdoch.edu.au/id/eprint/5194
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